≥1×10¹⁰ Ω・cm (specifiche elettriche del nucleo HPSI)
Trattamento superficiale:
Lucidatura a specchio CMP mono/bifacciale
Densità di Micropipe:
Grado di produzione di massa ≤1 ea/cm²
Descrizione di prodotto
Information of HPSI SiC Wafers HPSI (High Purity Semi-Insulating) silicon carbide wafers are critical foundational substrates for high-frequency GaN RF devices and advanced third-generation semiconductors. With the rapid expansion of 5G communication, millimeter-wave radar and aerospace electronics markets, the global SiC substrate market is projected to exceed USD 2 billion by 2030, playing an irreplaceable strategic role in next-generation wireless communication and high