| Marchio: | ZMSH |
| Numero di modello: | Substrato SiC 10×10mm |
| MOQ: | 25 |
| prezzo: | by case |
| Tempo di consegna: | 2-4 settimane |
| Condizioni di pagamento: | T/T |
The 4H-N type SiC 10*10 mm small wafer is a high-performance semiconductor substrate based on silicon carbide (SiC), a third-generation semiconductor material. Fabricated via Physical Vapor Transport (PVT) or High-Temperature Chemical Vapor Deposition (HTCVD), it is available in 4H-SiC or 6H-SiC polytypes and N-type or P-type doping configurations. With dimensional tolerances within ±0.05 mm and surface roughness Ra < 0.5 nm, each wafer is epitaxial-ready and undergoes rigorous inspection, including XRD crystallinity validation and optical microscopy defect analysis.
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| Parameter | Specification |
|---|---|
| Material Type | 4H-SiC (N-type doped) |
| Dimensions | 10*10 mm (±0.05 mm) |
| Thickness | 100–500 μm |
| Surface Roughness | Ra < 0.5 nm (polished) |
| Resistivity | 0.01–0.1 Ω·cm |
| Crystal Orientation | (0001) ±0.5° |
| Thermal Conductivity | 490 W/m·K |
| Defect Density | Micropipes: <1 cm⁻²; Dislocations: <10⁴ cm⁻² |
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Q: What are typical applications of 10*10 mm SiC wafers?
A: Ideal for prototyping power devices (MOSFETs/diodes), RF components, and high-temperature optoelectronics.
Q: How does SiC compare to silicon?
A: SiC offers 10* higher breakdown voltage, 3* better thermal conductivity, and superior high-temperature performance.
ZMSH Technology can provide customers with imported and domestic high-quality conductive, 2-6inch semi-insulating and HPSI (High Purity Semi-insulating) SiC substrates in batches; In addition, it can provide customers with homogeneous and heterogeneous silicon carbide epitaxial sheets, and can also be customized according to the specific needs of customers, with no minimum order quantity.